Archive for the ‘materials science’ Category
A group of researchers in Tokyo has lost their 2013 article in the Journal of Crystal Growth over commercial interests — which don’t appear to be their own.
The article, “Interactions between planar defects in bulk 3C-SiC,” came from a team consisting of a researcher at Keio University and scientists at two companies, HOYA Corporation, an optics firm, and SICOXS Corporation, which makes semiconductor wafers.
The journal Applied Surface Science (okay, so maybe it’s not called ASS at the home office) is retracting a pair of articles in its December issue.
The first, “Structure and mechanical properties of Ni–P electrodeposited coatings,” appeared in 2009 and was written by a group of researchers in Beijing. It has been cited nine times, according to Thomson Scientific’s Web of Knowledge. Its problem: Plagiarism. According to the retraction notice: Read the rest of this entry »
There’s a new retraction in the journal Carbon.
The case didn’t involve a Carbon copy — say, plagiarism or duplication — but rather an instance of fraud in a Japanese university, part of a larger case we covered last August.
Here’s the retraction notice for the paper, “The role of Fe species in the pyrolysis of Fe phthalocyanine and phenolic resin for preparation of carbon-based cathode catalysts,” which appeared in August 2010: Read the rest of this entry »